Optical Materials for Immersion Lithography
نویسندگان
چکیده
منابع مشابه
Immersion lithography with numerical apertures above 2.0 using high index optical materials
The progress of optical lithography has approached the sub-30 nm regime using 193nm excimer lasers as the exposure sources. To increase the numerical aperture (NA) further, many issues, especially those related to materials, need to be addressed. In this paper, we present the analytical and experimental results of oblique two-beam lithography with sapphire (Al2O3) as the optical material. At 19...
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For the next-generation immersion lithography technology, there is a growing interest in the immersion fluids having a refractive index larger than 1.5 and low absorbance at 193nm wavelength. In this paper, we report our effort in identifying new immersion fluid candidates. The absolute refractive index values and thermo-optic coefficients, dn/dT, were measured with 1x10 and 1x10 accuracy respe...
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The physical limitations of lithographic imaging are ultimately imposed by the refractive indices of the materials involved. At oblique collection angles, the numerical aperture of an optical system is determined by nsin(θ) , where n is the lowest material refractive index (in the absence of any refractive power through curvature). For 193nm water immersion lithography, the fluid is the limitin...
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As lithography quickly approaches its limits with current technologies, a host of new ideas is being proposed in hopes of pushing lithography to new levels of performance. The work presented in this thesis explores the use of an immersion scheme to improve the performance of a maskless lithographic technique known as Zone-Plate-Array Lithography (ZPAL). This is believed to be the first implemen...
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ژورنال
عنوان ژورنال: Journal of Photopolymer Science and Technology
سال: 2005
ISSN: 0914-9244,1349-6336
DOI: 10.2494/photopolymer.18.655